Oxidation process of indium‐alloyed TbFe amorphous films

摘要

Oxygen diffusion behavior in indium‐alloyed TbFe films is studied under several aging conditions. The oxygen‐suppression mechanism is discussed. The oxygen‐diffusion coefficients of TbFeIn films after aging are 1.5×10−22m2/s at 80 °C and 2×10−24m2/s at room temperature, both at 85 relative humidity. These coefficients are one‐tenth those previously reported for aged GdTbFe and TbFeCo films. The activation energy of TbFeIn films is 1.5 times larger than that of GdTbFe films. A diffusion model based on In characteristics and involving vacancy sites in the films is presented.