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首页> 外文期刊>Journal of Applied Physics >Enhanced dielectric and piezoelectric properties in the 001-poled 0.25Pb(In1/2Nb1/2)O-3-0.43Pb (Mg1/3Nb2/3)O-3-0.32PbTiO(3) single crystal near morphotropic phase boundary by alternating current treatment
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Enhanced dielectric and piezoelectric properties in the 001-poled 0.25Pb(In1/2Nb1/2)O-3-0.43Pb (Mg1/3Nb2/3)O-3-0.32PbTiO(3) single crystal near morphotropic phase boundary by alternating current treatment

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In this paper, temperature dependance of induced dielectric and piezoelectric properties in the 001-oriented predirect current poling (DCP) of the 0.25Pb(In1/2Nb1/2)O-3-0.43Pb(Mg1/3Nb2/3)O-3-0.32PbTiO(3) (0.25PIN-0.43PMN-0.32PT) single crystals near morphotropic phase boundary was investigated using the alternating current treatment (ACT). By the optimized ACT conditions of 1 kV/mm at 50 Hz over 20 cycles, the dielectric permittivity (epsilon(T)(33)/epsilon(0)) and piezoelectric coefficient (d(33)) at room temperature of the DCP-ACT crystal were improved to be 7120 and 2610 pC/N, which were 48 and 54 higher than that of the DCP crystal (epsilon(T)(33)/epsilon(0) = 4800, d(33) = 1700 pC/N). Based on the temperature dependence of dielectric permittivity and dielectric loss of the DCP-ACT crystal, the induced monoclinic phases (MA and MC) were involved in the phase transition process from a rhombohedral phase to a tetragonal phase. The phase transition temperatures TR-MA of 116 degrees C of the DCP-ACT crystal showed about 10 degrees C higher than that of DCP. Meanwhile, epsilon(T)(33)/epsilon(0) of the DCP-ACT crystal at TR-MA and in the tetragonal phase region, at around 110 degrees C and 130 degrees C, were 160 and 390 higher than those of the DCP crystal, respectively. The ultrahigh epsilon(T)(33)/epsilon(0) = 17 000 of the DCP-ACT crystal at 130 degrees C may relate to the nanoscale heterogeneous polar-regions induced by ACT. The ACT is a promising way to enhance the dielectric and piezoelectric performance of the pre-DCP 0.25PIN-0.43PMN-0.32PT single crystals with broadened temperature range for device applications. Published under license by AIP Publishing.

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