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首页> 外文期刊>bulletin of the korean chemical society >Dynamics of Gas-phase Hydrogen Atom Reaction with Chemisorbed Hydrogen Atoms on a Silicon Surface
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Dynamics of Gas-phase Hydrogen Atom Reaction with Chemisorbed Hydrogen Atoms on a Silicon Surface

机译:硅表面化学吸附氢原子的气相氢原子反应动力学

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The collision-induced reaction of gas-phase atomic hydrogen with hydrogen atoms chemisorbed on a silicon (001)-(2】1) surface is studied by use of the classical trajectory approach. The model is based on reaction zone atoms interacting with a finite number of primary system silicon atoms, which then are coupled to the heat bath, i.e., the bulk solid phase. The potential energy of the HadsˉHgas interaction is the primary driver of the reaction, and in all reactive collisions, there is an efficient flow of energy from this interaction to the Hads-Si bond. All reactive events occur on a subpicosecond scale, following the Eley-Rideal mechanism. These events occur in a localized region around the adatom site on the surface. The reaction probability shows the maximum near 700K as the gas temperature increases, but it is nearly independent of the surface temperature up to 700 K. Over the surface temperature range of 0-700 K and gas temperature range of 300 to 2500 K, the reaction probability lies at about 0.1. The reaction energy available for the product states is small, and most of this energy is carried away by the desorbing H2 in its translational and vibrational motions. The Langevin equation is used to consider energy exchange between the reaction zone and the bulk solid phase.
机译:采用经典的轨迹方法研究了气相氢原子与化学吸附在硅(001)-(2】1)表面的氢原子的碰撞诱导反应.该模型基于反应区原子与有限数量的初级系统硅原子相互作用,然后将其耦合到热浴,即体固相。HadsˉHgas相互作用的势能是反应的主要驱动因素,在所有反应性碰撞中,从这种相互作用到Hads-Si键的能量流动都是有效的。所有反应性事件发生在亚皮秒尺度上,遵循 Eley-Rideal 机制。这些事件发生在表面 adatom 位点周围的局部区域。随着气体温度的升高,反应概率显示最大值接近700K,但它几乎与高达700 K的表面温度无关。在0-700 K的表面温度范围和300-2500 K的气体温度范围内,反应概率约为0.1。可用于产物状态的反应能量很小,大部分能量被解吸 H2 在其平移和振动运动中带走。Langevin 方程用于考虑反应区和体固相之间的能量交换。

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