Two new peroxoniobophosphate clusters were isolated as tetramethylammonium (TMA) salts having the stoichiometries: TMA(5)HNb4P2O14(O-2)(4)center dot 9H(2)O and TMA(3)H7Nb6P4O24(O-2)(6)center dot 7H(2)O. The former is stable over the pH range: 3 < pH < 12 and the latter is stable only below pH 3. These two molecules interconvert as a function of solution pH. The H7Nb6P4O24(O-2)(6)(3-) cluster can be used to fabricate patterned niobium phosphate films by electron-beam lithography after solution deposition.
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