A portable, universal narrowband XUV diagnostic suitable for calibration of various XUV light sources, was built, tested and fully calibrated. The diagnostic allows measurement of the absolute XUV energy and average power in two selected wavelength bands, at 11.4 and 13.4nm. In addition, the pulse-to-pulse and long-term XUV stability of the source can be assessed, as well as the contamination of multilayer XUV optics exposed to the source. This paper describes the full calibration procedure: all optical elements were calibrated at the wavelength of operation by Physikalisch-Technische Bundesanstalt at the storage ring Bessy II, a full analysis of geometrical factors was done, and the influence of the spectral emissivity of the source on the calibration was analyzed in detail. The calibration was performed both for the centroid wavelength as for the full bandwidth of the diagnostic. The total uncertainty in the absolute calibration allowed measurement of source characteristics with an uncertainty of less than 5, and a shot-to-shot repeatability to less than 2. The uncertainty was mainly determined by external factors like background gas distribution and spectral source characteristics. Examples of application to a laser plasma and discharge plasma XUV source are given. (C) 2002 Elsevier Science B.V. All rights reserved. References: 27
展开▼
