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首页> 外文期刊>IEEE Transactions on Microwave Theory and Techniques >A Nonlinear Q-Switching Impedance Technique for Picosecond Pulse Radiation in Silicon
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A Nonlinear Q-Switching Impedance Technique for Picosecond Pulse Radiation in Silicon

机译:硅中皮秒脉冲辐射的非线性调Q阻抗阻抗技术

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摘要

This paper presents a nonlinear Q-switching impedance (NLQSI) technique for picosecond pulse radiation in silicon. A prototype chip is designed with four NLQSI-based impulse generation channels, which can produce picosecond pulses with a reconfigurable amplitude. An on-chip impulse-coupling scheme combines the outputs from four channels and delivers the combined signal to an on-chip antenna. In addition, an asynchronous optical-sampling measurement system is used to characterize the radiated picosecond pulses in the time domain. The prototype chip can radiate 4-ps pulses with an SNR > 1 bandwidth of 161 GHz. Furthermore, pulse amplitude modulation is experimentally demonstrated. The prototype chip is fabricated in a 130-nm SiGe BiCMOS process technology with a die area of 1 mm(2).
机译:本文介绍了一种用于硅皮秒脉冲辐射的非线性调Q阻抗(NLQSI)技术。原型芯片设计有四个基于NLQSI的脉冲生成通道,可以产生具有可重构幅度的皮秒脉冲。片上脉冲耦合方案将四个通道的输出组合在一起,并将组合信号传送到片上天线。此外,异步光学采样测量系统用于表征时域中的辐射皮秒脉冲。原型芯片可以辐射 4ps 脉冲,SNR > 1 带宽为 161 GHz。此外,还通过实验证明了脉冲幅度调制。原型芯片采用 130nm SiGe BiCMOS 工艺技术制造,芯片面积为 1 mm(2)。

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