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首页> 外文期刊>Optical and Quantum Electronics >Optical characterization of nanostructured Ge1-xSnxSe2.5 (x=0, 0.3, 0.5) films
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Optical characterization of nanostructured Ge1-xSnxSe2.5 (x=0, 0.3, 0.5) films

机译:纳米结构Ge1-xSnxSe2.5(x=0,0.3,0.5)薄膜的光学表征

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The paper reports the optical properties of thin films of nanostructured Ge1-xSnxSe2.5 (x=0, 0.3, 0.5) glassy alloys. The glassy alloys of Ge1-xSnxSe2.5 (x=0, 0.3, 0.5) were prepared using melt quenching method. Thin films of nanostructured Ge1-xSnxSe2.5 (x=0, 0.3, 0.5) glassy alloys were prepared using physical vapor deposition method. The films were characterized using XRD, EDX and TEM, which confirmed the amorphous nature, composition and formation of nanorods in the samples. Absorption and transmission spectra of thin films were recorded in the spectral range 400-2500nm to obtain energy band gap, refractive index, extinction coefficient, dielectric constant etc. Results show that refractive index increases while band gap decreases on increase of Sn content in the Ge-Se system. This is due to the increase in density of defect states within band gap. The values of Urbach energy support the obtained results.
机译:该论文报道了纳米结构Ge1-xSnxSe2.5(x=0,0.3,0.5)玻璃合金薄膜的光学性能。采用熔融淬火法制备了Ge1-xSnxSe2.5(x=0、0.3、0.5)的玻璃合金。采用物理气相沉积法制备了纳米结构Ge1-xSnxSe2.5(x=0,0.3,0.5)玻璃合金薄膜。采用XRD、EDX和TEM对薄膜进行了表征,证实了样品中纳米棒的无定形性质、组成和形成。记录薄膜在400-2500nm光谱范围内的吸收和透射光谱,得到能带隙、折射率、消光系数、介电常数等。结果表明,随着Ge-Se体系中Sn含量的增加,折射率增大,带隙减小。这是由于带隙内缺陷态密度的增加。Urbach 能量值支持所获得的结果。

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