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首页> 外文期刊>Acta materialia >Evolution of grain boundary films in liquid phase sintered silicon nitride during high-temperature testing
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Evolution of grain boundary films in liquid phase sintered silicon nitride during high-temperature testing

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摘要

Transmission electron microscopy (TEM) is used tostudy the effect of high-temperature tests on the amorphous grainboundary films in a commercial, liquid phase sintered silicon nitride ceramic.

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