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首页> 外文期刊>Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films >First-principles calculations for understanding high conductivity and optical transparency in InxCd1-x films
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First-principles calculations for understanding high conductivity and optical transparency in InxCd1-x films

机译:用于了解 InxCd1-x 薄膜中高电导率和光学透明度的第一性原理计算

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We investigate InxCd1-xO materials, where x = 0.0, 0.031, 0.063 and 0.125, to understand their high electrical conductivity and optical transparency windows, using the full-potential linearized augmented plane wave (FLAPW) method. In addition, we employ the screened exchange LDA (sX-LDA) method to evaluate accurate band structures including band gap that is underestimated by the LDA calculations. The results show a dramatic Burstein-Moss shift of the absorption edge by the In doping, reflecting the small effective mass of the Cd 5s conduction band. The calculated direct band gaps, 2.36 eV for x=0.0 and 3.17 eV for x= 0.063, show excellent agreement with experiment. The effective mass of the conduction band of CdO is calculated to be 0.24 in, (in the Delta direction), in good agreement with an experimental value of 0.27m(e), explaining its high electrical conductivity. The hybridization between the Cd 5s and the In 5s states yields complex many-body effects in the conduction bands: a hybridization gap in the conduction bands and a band-gap narrowing which cancels the further Burstein-Moss shift for higher In doping. (C) 2002 Elsevier Science B.V. All rights reserved. References: 32
机译:我们研究了 InxCd1-xO 材料,其中 x = 0.0、0.031、0.063 和 0.125,以了解它们的高电导率和光学透明窗口,使用全电位线性化增强平面波 (FLAPW) 方法。此外,我们采用屏蔽交换LDA(sX-LDA)方法来评估准确的能带结构,包括LDA计算低估的带隙。结果表明,In掺杂对吸收边缘产生了显著的Burstein-Moss偏移,反映了Cd 5s导带的小有效质量。计算出的直接带隙(x=0.0时为2.36 eV,x=0.063时为3.17 eV)与实验结果吻合。计算出CdO导带的有效质量为0.24英寸(在Delta方向),与实验值0.27m(e)非常吻合,解释了其高电导率。Cd 5s 和 In 5s 状态之间的杂化在导带中产生复杂的多体效应:导带中的杂化间隙和带隙变窄,从而抵消了进一步的 Burstein-Moss 位移以获得更高的 In 掺杂。(C) 2002 Elsevier Science B.V.保留所有权利。[参考文献: 32]

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