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首页> 外文期刊>journal of applied physics >Excitation mechanisms responsible for the 615.0hyphen;nm oscillation in a Hehyphen;Hg ion laser
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Excitation mechanisms responsible for the 615.0hyphen;nm oscillation in a Hehyphen;Hg ion laser

机译:Excitation mechanisms responsible for the 615.0hyphen;nm oscillation in a Hehyphen;Hg ion laser

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摘要

Selective excitation processes responsible for the lasing of singly ionized mercury at 615.0 nm in a Hehyphen;Hg pulsed discharge have been studied by observing the time variation of the populations of the reactants using the Hook method and the sidehyphen;light method. It is found that in the decaying plasma of a pulsed discharge, the principal process is the Penning reaction, while during the discharge the chargehyphen;transferhyphen;type reaction predominates.

著录项

  • 来源
    《journal of applied physics》 |1981年第4期|2699-2704|共页
  • 作者

    Shiro Horiguchi;

  • 作者单位
  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类
  • 关键词

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