...
首页> 外文期刊>journal of applied physics >Stability of a ferroelectric copolymerhyphen;induced inversion layer in silicon
【24h】

Stability of a ferroelectric copolymerhyphen;induced inversion layer in silicon

机译:Stability of a ferroelectric copolymerhyphen;induced inversion layer in silicon

获取原文

摘要

A copolymer of vinylidene fluoride and tetrafluoroethylene is solution cast on aphyphen;type silicon wafer. A strong inversion is produced at the silicon surface when the copolymer film is corona charged or when a subsequently evaporated aluminum gate is biased. Although the dipole alignment in the copolymer is stable, the inversion decays. The decay of the inversion layer is monitored by measuring the decay of the surface channel currents between a source and a drain. For the case of corona charging, an initial rapid decay not observed in the gated device is explained by the motion of excess positive charges (dielectric relaxation). The slow decay subsequently observed is explained in terms of the thermionic injection of inversion electrons across an interface barrier and also using a spacehyphen;chargehyphen;limited injection model. Both models fit the results and their validity is discussed.

著录项

获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号