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Optical absorption and photoluminescence studies of thin GaAs layers in GaAssngbnd;AlxGa1−xAs double heterostructures

机译:GaAssngbnd;AlxGa1−xAs双异质结构中薄砷化镓层的光吸收和光致发光研究

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A three‐layered AlxGa1−xAssngbnd;GaAssngbnd;AlxGa1−xAs structure has been used to measure the optical absorption and photoluminescence in thin GaAs layers prepared by liquid‐phase epitaxy. The results presented here are for lightly dopedn‐type GaAs with free‐carrier concentrations near 1016cm−3; however, the technique can be used for arbitrarily doped material. The absorption coefficient agr; was measured between 1.4 and 2.2 eV at 2 and 298 K. The absorption strength at the band gap was found to be (1.15×104)±1000 cm−1at 2 K and (0.99×104)±1000 cm−1at 298 K. At 1.96 eV, the energy of the Hesngbnd;Ne laser commonly used for photoexcitation of GaAs, agr; at 298 K was measured to be 4.4×104cm−1. A value of 3.8 meV for the room‐temperature exciton binding energy was inferred from the temperature dependence of the interband absorption strength. This value together with previous reflectivity data for high‐purity GaAs gives the energy gap of pure unstrained GaAs at 298 K as 1.424±0.001 eV. The effects of strain due to lattice mismatch in the three‐layered structures were observed in the absorption edge at 2 K. The calculated photoluminescence spectrum obtained through the principle of detailed balance from the absorption data agrees well with the measured photoluminescence at 298 K. A comparison of the photoluminescence from the excited surface and back surface permits assignment of an upper limit of 5×104cm/sec for the room‐temperature GaAssngbnd;AlxGa1−xAs interface recombination velocity forx≈ 0.5. This comparison of the front and back photoluminescence also shows that the minority‐carrier diffusion length at 298 K for a sample with an electron concentration of 2×1016cm−3is at least 2.5 mgr;. The data presented here can be used to calculate the intrinsic carrier concentrationni, the thermal radiative generation rateG, and the radiative constantB(=Rr/np). The values at 298 K (corrected where necessary to a band‐gap energyEg=1.424 eV) are as follows:ni=1.8×106cm−3,G=4500 cm−3/sec, andB=1.4×10−9cm3/sec.
机译:三层AlxGa1−xAs&sngbnd;GaAs&sngbnd;AlxGa1−xAs结构已被用于测量液相外延制备的薄GaAs层中的光吸收和光致发光。本文给出的结果是轻掺杂&连字符型砷化镓,游离&连字符载流子浓度接近1016cm−3;然而,该技术可用于任意掺杂的材料。在2至298 K时,吸收系数&agr;在1.4至2.2 eV之间测量。在2 K时,带隙处的吸收强度为(1.15×104)±1000 cm−1,在298 K时为(0.99×104)±1000 cm−1。 在1.96 eV时,通常用于GaAs,&agr;在298 K光激发下的He&sngbnd;Ne激光的能量为4.4×104cm−1。从带间吸收强度的温度依赖性推断出室温激子结合能的值为3.8 meV。该值与先前高纯度GaAs的反射率数据一起,给出了纯非应变GaAs在298 K时的能隙为1.424±0.001 eV。在2 K的吸收边缘观察到三层结构中晶格错配引起的应变效应。通过吸收数据的详细平衡原理计算出的光致发光光谱与在298 K下测得的光致发光光谱非常吻合。通过比较激发表面和背面的光致发光,可以确定房间温度GaAs&sngbnd&sngbnd-AlxGa1−xAs界面复合速度≈0.5的上限为5×104cm/sec。这种正面和背面光致发光的比较还表明,对于电子浓度为2×1016cm−3的样品,在298 K处的少数载流子扩散长度至少为2.5 &mgr;。这里提供的数据可用于计算本征载流子浓度ni、热辐射产生率G和辐射常数B(=Rr/np)。298 K处的值(必要时校正为带&连字符;间隙能量Eg=1.424 eV)如下:ni=1.8×106cm−3,G=4500 cm−3/sec,和B=1.4×10−9cm3/sec。

著录项

  • 来源
    《journal of applied physics》 |1974年第2期|800-807|共页
  • 作者

    D. D. Sell; H. C. Casey;

  • 作者单位
  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
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