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Carrier mobilities at weakly inverted silicon surfaces

机译:弱倒置硅表面的载流子迁移率

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摘要

A theory for carrier mobilities at weakly inverted Si surfaces is described. The theory treats transport of carriers across barriers in regions of statistically variable surface potentials. The potential variations are related to an earlier model proposed by Nicollian and Goetzberger to explain trapping phenomena. Measurements of surface conductance at inverted Si surfaces are presented which extend to lower free‐carrier populations than previously reported work. For bothpandnsurface channels, the measurements show a region of near constancy in mobility at very low surface densities followed by a rapidly increasing mobility at voltages near the conventional inversion threshold. The general features of these measurements and of their temperature variations correlate well with the theoretical model proposed.
机译:描述了弱倒硅表面的载流子迁移理论。该理论处理了载流子在统计上可变的表面电位区域中跨越障碍的传输。潜在的变化与Nicollian和Goetzberger提出的早期模型有关,用于解释诱捕现象。给出了倒置硅表面表面电导的测量结果,与先前报道的工作相比,这些测量扩展到更低的自由和连字符载流子群体。对于两个表面通道,测量结果显示,在非常低的表面密度下,迁移率区域几乎是恒定的,随后在接近常规反转阈值的电压下,迁移率迅速增加。这些测量的一般特征及其温度变化与所提出的理论模型密切相关。

著录项

  • 来源
    《journal of applied physics》 |1974年第2期|828-834|共页
  • 作者

    J. T. C. Chen; R. S. Muller;

  • 作者单位
  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类
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