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Effect of Au nucleation centers and deposition rate on crystallinity and electronic properties of evaporated Te films.

机译:Au成核中心和沉积速率对蒸发Te薄膜结晶度和电子性能的影响.

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摘要

The effect of Au nucleation sites, deposition rates, and the film thickness on the crystallinity and electronic properties of evaporated Te films has been investigated. It has been found that to obtain large−grain Te films there exists an optimum conditoin in the coating ratio of Au nucleation sites and the film thickness of Te, and that a fast deposition rate of Te results generally in large−grain Te films with preferred orientation. The best films obtained have shown a grain size of 20−30 mgr; diameter with thecaxis parallel to the substrate and a Hall mobility of 170 cm2V−1sec−1.
机译:研究了Au成核位点、沉积速率和膜厚对蒸发Te薄膜结晶度和电子性能的影响.研究发现,为了获得大晶粒的Te薄膜,Au成核位点的包覆率和Te的膜厚存在最佳条件,并且Te的快速沉积速率通常会导致具有优选取向的大晶粒Te薄膜。得到的最佳薄膜显示出直径为20−30 &mgr;的晶粒尺寸,平行于基板的轴,霍尔迁移率为170 cm2V−1sec−1。

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