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Measurements of Peltier cooling at a Ga‐GaAs interface using a liquid‐phase epitaxy system

机译:使用液相外延系统测量Ga连字符;GaAs界面处的帕尔帖冷却

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The Peltier coefficient ofn‐type GaAs was measured by passing an electrical current through the GaAs‐Ga solid‐liquid interface in a vertical liquid‐phase epitaxy (LPE) system. Application of a steady‐state heat‐transfer analysis yielded values for the Peltier coefficient of 0.141 to 0.203 V in the 530–830 °C temperature range. From the study of measurements of Peltier cooling as a function of GaAs substrate thickness, current amplitude, and system geometry, it was concluded that effective utilization of Peltier cooling depends greatly on specimen thickness, doping, and furnace temperature, especially in LPE applications.
机译:通过在垂直液体&连字符相外延 (LPE) 系统中将电流通过 GaAs&连字符&Ga固&连字符-液体界面来测量 n&连字符型 GaAs 的帕尔帖系数。应用稳态热和传递分析,在530–830°C温度范围内,帕尔帖系数为0.141至0.203 V。通过研究帕尔帖冷却与砷化镓衬底厚度、电流幅度和系统几何形状的关系,得出的结论是,帕尔贴冷却的有效利用在很大程度上取决于试样厚度、掺杂和炉温,尤其是在 LPE 应用中。

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