Structural study of refractory-metal-free C40 TiSi_(2) and its transformation to C54 TiSi_(2)

摘要

The structure of laser-induced refractory-metal-free C40 TiSi_(2) has been studied by glancing-angle x-ray diffraction (GAXRD) in detail. The result shows that laser-induced C40 TiSi_(2) has a hexagonal structure with the P6_(2)22 space group and lattice parameters a=0.467 nm and c=0.662 nm. The ordering effect and the stress effect on the TiSi_(2) film are also discussed based on the GAXRD and micro-Raman results. The C40 phase completely transforms to the technologically important C54 phase at a relatively low temperature of 700℃.