ArF (Bndash;X) emission at 193 nm has been studied as a function of pressure in Ar/F2, Ar/NF3, Ne/Ar/F2, and Ne/Ar/NF3mixtures under long pulse electronhyphen;beam excitation. Fluorescence yield, formation yield, as well as apparent quenching rate constants of the ArFast; (B) state by Ne, Ar, F2, and NF3have been measured. While the ArFast; formation yield is about the same as per neon or argon excitation produced, highest fluorescence yield is obtained from a Ne/Ar/F2mixture. Using Ne as the main diluent gas prevents the rapid conversion of ArFast; to Ar2Fast; and Ne itself is a slower quencher of ArFast; than Ar.
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