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首页> 外文期刊>journal of applied physics >Excimer laser photolysis study of NH3in the presence of NO at 193 nm
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Excimer laser photolysis study of NH3in the presence of NO at 193 nm

机译:Excimer laser photolysis study of NH3in the presence of NO at 193 nm

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Excimer laser photolysis has been studied for NH3and NO mixtures at the wavelength of 193 nm. The amount of decomposition of NO was compared with the incident photon energy. It was found that NO decomposition occurs with a quantum yield of 0.94.

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