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Use of heavy doping effects to calculate the electrostatic field acting on the impurity atoms

机译:Use of heavy doping effects to calculate the electrostatic field acting on the impurity atoms

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摘要

Considering the heavyhyphen;doping and highhyphen;temperature effects, the electrostatic field acting on the phosphorus atoms into silicon during their diffusion at high temperatures is calculated. It is found that our theory predicts a smaller field than the classically expected results. This anomaly is explained basically by the fact that the Debye length decreases with the increase in the impurity concentration, which ultimately reduces the electric field produced.

著录项

  • 来源
    《journal of applied physics 》 |1978年第2期| 946-948| 共页
  • 作者

    R. K. Jain;

  • 作者单位
  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类
  • 关键词

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