The magnetic anisotropy of epitaxial Cu-NiCu-Si(001) films, with Ni thickness between 17 and 150 A, has been studied by Brillouin light scattering from spin waves. Both the Neel interface anisotropy term and the second-order magnetoelastic coefficient have been assumed as adjustable parameters in the best fit procedure of the effective anisotropy constant as a function of the Ni thickness. These results are in very good agreement with those previously obtained by torque magnetometry.
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