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Ion source improvement by electron injection from a ferroelectric cathode

机译:通过铁电阴极的电子注入改善离子源

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With increasing rf power, the electron concentration in the plasma of electron cyclotron resonance (ECR) ion sources is decreasing in comparison to the ion concentration, so that the plasma is charging up positively. When reviewing the basic performance requirements of ECR sources it becomes evident that the direct injection of electrons into the ECR plasma is increasing the electron charge density and the ion current yield. Ferroelectric ceramics was used as very robust, electron emitting cathode material under the heavy-duty conditions inside the plasma chamber of an ECR ion source. The electron emission from the ferroelectric cathode is turned on by a high repetition-rate bipolar pulse of ±1.2 to 1.6 kV amplitude to the electrodes deposited on both sides of the disk-shaped cathode. Lead-barium-zirconium-titanate (30/70/30) cathodes doped with 2 mol Bi_(2)O_(3) were installed and tested in the Ar-ion plasma of the ECR ion source CAESAR at INFN-LNS, Catania. The aim was to visibly increase the yield of the ion output current by electron injection. The plasma was heated by rf in continuous mode, while the ferroelectric cathode was pulsed at a repetition rate of 50 to 250 Hz. Pulsed electron injection at 250 Hz led to a noticeable increase of 30 of the Ar~(8)+ output current at a rf power level of 400 W. In addition, magnetohydrodynamic instabilities were damped during and after electron injection. These results strongly encourage further research and development on the application of ferroelectric cathodes for increasing the ion current yield from hot plasma ion sources.
机译:随着射频功率的增加,电子回旋共振(ECR)离子源等离子体中的电子浓度与离子浓度相比正在降低,因此等离子体正在正向充电。在回顾ECR源的基本性能要求时,很明显,将电子直接注入ECR等离子体会增加电子电荷密度和离子电流产率。铁电陶瓷在ECR离子源的等离子体室内的重载条件下被用作非常坚固的电子发射阴极材料。铁电阴极的电子发射通过振幅为 ±1.2 至 1.6 kV 的高重复率双极性脉冲打开,该脉冲沉积在圆盘形阴极两侧的电极。在卡塔尼亚INFN-LNS的ECR离子源CAESAR的氩离子等离子体中安装并测试了掺杂了2 mol %Bi_(2)O_(3)的铅-钡-锆-钛酸铅-钡-锆(30/70/30)阴极。目的是通过电子注入明显提高离子输出电流的产率。等离子体在连续模式下被射频加热,而铁电阴极以 50 至 250 Hz 的重复速率脉冲。 在 400 W 的射频功率水平下,250 Hz 的脉冲电子注入导致 Ar~(8)+ 输出电流显着增加 30%。此外,在电子注入期间和之后,磁流体动力学的不稳定性受到抑制。这些结果极大地促进了铁电阴极在提高热等离子体离子源离子电流产率方面的应用的进一步研究和开发。

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