Linear arc discharge source for large area plasma processing

摘要

A linearly scalable plasma source based on the radio frequency generated hot hollow cathode discharge between two parallel plates with a magnetic field perpendicular to the plates near the outlet of the cathode is introduced. The magnetic field facilitates and confines the hollow cathode 'discharge which leads to a high power density and a high cathode wall tempera0are. The geometry. and location of hot zones is directly controlled by magnetic field. The linear arc discharge (LAD) source exhibits similar features as the cylindrical radio frequency hollow Cathode plasma jet. Experiments indicate a metastable assisted growth of TiN films. LAD source extends abilities of the radio frequency hollow cathode plasma jet to the large area processing. # 1997American Institute of Physics. S0003 6951(97)03205-1