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Interdependence of strain, precipitation, and dislocation formation in epitaxial Se‐doped GaAs

机译:外延Se‐掺杂GaAs中应变、析出和位错形成的相互依赖性

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The defect morphology of Se‐doped GaAs grown by CVD on undoped 100‐oriented GaAs substrates has been studied by transmission electron microscopy. Two types of samples are discussed: The first is nearly saturated,n≅NSe≅ 4 × 1018cm−3; the second is supersaturated,n≅ 1.5 × 1019cm−3,NSe≅ 4 × 1019cm−3. The nearly saturated samples exhibit an array of small features (probably Frank loops) near the original interface and have a density of misfit relieving dislocations≲103 cm−1. The supersaturated samples show a large number of Frank loops, whose density decreases monotonically with distance away from the original interface while their diameterincreasesin this direction. The loops seem to be invariably connected with one or more very small precipitate particles of Ga2Se3. Most of the Frank loops are of the intrinsic type; these are sometimes accompanied by closely neighboring loops of extrinsic nature. Pure edge misfit relieving dislocations with a density ≅ 104cm−1are observed at the interface, running in one of the⟨011⟩directions, but not in the orthogonal direction. A model is proposed to explain these results. Among the ingredients of this model are the notions (i) that misfit dislocations are asymmetrically introduced well away from the original interface and climb to that interface; (ii) that the solubility of Se in GaAs is a function of the imposed strain; and (iii) that the precipitation of Ga2Se3in GaAs is accompanied by the formation of both As vacancies and interstitial Ga in the matrix.
机译:采用透射电子显微镜研究了CVD在未掺杂的100取向GaAs衬底上生长的Se‐掺杂GaAs的缺陷形貌.讨论了两种类型的样品:第一种是近饱和的,n≅NSe≅ 4 × 1018cm−3;第二种是过饱和的,n≅1.5×1019cm−3,NSe≅4×1019cm−3。接近饱和的样品在原始界面附近表现出一系列小特征(可能是弗兰克环),并且具有错配缓解位错的密度≲103 cm−1。过饱和样品显示出大量的弗兰克环,其密度随着远离原始界面的距离而单调减小,而它们的直径则沿该方向增加。这些环似乎总是与一个或多个非常小的 Ga2Se3 沉淀颗粒相连。大多数 Frank 循环都是内在类型的;这些有时伴随着外在性质的紧密相邻的循环。在界面处观察到密度≅104cm−1的纯边缘错配缓解位错,沿〈011〉方向之一运行,但不沿正交方向运行。提出了一个模型来解释这些结果。该模型的组成部分包括以下概念:(i)不对称地引入不对称的远离原始界面并爬升到该界面;(ii)硒在砷化镓中的溶解度是施加应变的函数;(iii)Ga2Se3在GaAs中的沉淀伴随着基质中As空位和间隙Ga的形成。

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