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The role of dislocation‐dislocation interactions in the relaxation of pseudomorphically strained semiconductors. I. Theory

机译:位错连字符位错相互作用在假晶应变半导体弛豫中的作用。一、理论

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摘要

The role of dislocation‐dislocation interactions on the relaxation behavior of biaxially stressed semiconductor thin films is considered by including interaction terms in an energy minimization. Both parallel and crossing interactions are considered and energies are calculated for orthogonal arrays of equally spaced 60° misfit dislocations, and it is shown that the parallel interactions can be either attractive or repulsive. The equilibrium misfit dislocation density is shown to be a function of the ‘‘cutoff’’ distance for dislocation interactions in these structures.
机译:通过在能量最小化中加入相互作用项,考虑了位错相互作用对双轴应力半导体薄膜弛豫行为的作用。同时考虑了平行和交叉相互作用,并计算了等距 60° 错配位错的正交阵列的能量,结果表明,平行相互作用可以是吸引的,也可以是排斥的。平衡错配位错密度被证明是这些结构中位错相互作用的“截止”距离的函数。

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