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Verification of hot hole scattering rates in silicon by quantum-yield experiment

机译:通过量子产率实验验证硅中的热孔散射率

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摘要

High-energy hole scattering rates for a full-band Monte Carlo simulation in Si are verified using a quantum-yield experiment. We compare two models that yield the correct drift velocity and ionization coefficient but quite different energy distributions. It is demonstrated that the quantum-yield experiment provides a means for monitoring hole scattering rates in Si; the model based on the ab initio impact ionization rate shows good agreement with the experiments, while the random-k approximation proposed by Kane overestimates the ionization rate of holes near the threshold energy.
机译:使用量子产率实验验证了Si中全波段蒙特卡罗模拟的高能空穴散射率。我们比较了两个模型,它们产生了正确的漂移速度和电离系数,但能量分布却截然不同。结果表明,量子产率实验为监测Si中的空穴散射速率提供了一种手段;基于AB从头撞击电离率的模型与实验结果吻合较好,而Kane提出的随机K近似高估了临界能量附近空穴的电离速率。

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