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Design and performances of maximum‐efficiency single‐ and double‐drift‐region GaAs IMPATT diodes in the 3–18‐GHz frequency range

机译:在3–18GHz频率范围内,最大效率单频和双频漂移的GaAs IMPATT二极管的设计和性能

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The purpose of this paper is to give the main conclusions of a theoretical study on high‐efficiency GaAs IMPATT diodes. First, we intend to choose the best structure to achieve these high efficiencies (HL or LHL doping profile). Then, for this structure, we define the optimum parameters (widths, impurity‐concentration values, slope of the transit zone profile) and the optimum operating conditions, allowing us to obtain the maximum efficiency which can be expected for single‐ and double‐drift‐region diodes in the 3–18‐GHz frequency range. A comparison with the best experimental results for single‐drift region structures (HL junction, LHL junction, HL barrier, LHL barrier) corroborates our theoretical predictions.
机译:本文旨在为高效率GaAs IMPATT二极管的理论研究提供主要结论。首先,我们打算选择最佳结构来实现这些高效率(HL或LHL掺杂曲线)。然后,对于这种结构,我们定义了最佳参数(宽度、杂质和连字符浓度值、中转带剖面的斜率)和最佳操作条件,使我们能够获得 3–18 GHz 频率范围内单个连字符和双连字符漂移连字符区域二极管的最大效率。与单连字符漂移区结构(HL结、LHL结、HL势垒、LHL势垒)的最佳实验结果的比较证实了我们的理论预测。

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