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Kinematical x‐ray diffraction in nonuniform crystalline films: Strain and damage distributions in ion‐implanted garnets

机译:非均匀结晶薄膜中的运动学 x连字符射线衍射:离子连字符注入石榴石中的应变和损伤分布

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摘要

A kinematical model for general Bragg case x‐ray diffraction in nonuniform films is presented. The model incorporates depth‐dependent strain and spherically symmetric Gaussian distribution of randomly displaced atoms. The model is applicable to ion‐implanted, diffused, and other single crystals. Layer thickness is arbitrary, provided maximum reflecting power is less than ∼6. Strain and random displacement (damage) distributions in He+‐implanted Gd, Tm, Ga:YIG, and Ne+‐implanted Gd3Ga5O12are obtained by fitting the model to experimental rocking curves. In the former crystal the layer thickness was 0.89 mgr;m with strain varying between 0.09 and 0.91. In the latter crystal a wide range of strain and damage was obtained using successively higher doses. In each case layer thickness was 1900 A˚, with 2.49 strain corresponding to 0.40‐A˚ standard deviation of random displacements. The strain distributions were strictly linear with dose. The same, closely linear relationship between damage and implantation‐induced strain was determined for both crystals.
机译:给出了非均匀薄膜中一般布拉格情况x&连字符射线衍射的运动学模型.该模型结合了深度和连字符相关的应变和随机位移原子的球对称高斯分布。该模型适用于离子和连字符、注入、扩散和其他单晶。层厚是任意的,前提是最大反射功率小于 ∼6%。通过将模型拟合到实验摇摆曲线上,得到了He+&连字符;植入Gd、Tm、Ga:YIG和Ne+‐植入Gd3Ga5O12的应变和随机位移(损伤)分布。在前一个晶体中,层厚度为0.89 &mgr;m,应变在0.09和0.91%之间变化。在后一种晶体中,使用连续更高的剂量获得了广泛的应变和损伤。在每种情况下,层厚度为1900 A&环;,2.49%应变对应于0.40&连字符;A&环的随机位移标准差。菌株分布与剂量严格呈线性关系。对于两种晶体,确定了损伤和注入&连字符诱导应变之间相同的紧密线性关系。

著录项

  • 来源
    《journal of applied physics》 |1981年第10期|6094-6103|共页
  • 作者

    V. S. Speriosu;

  • 作者单位
  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类
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