...
首页> 外文期刊>journal of applied physics >Internal stress and internal friction in thinhyphen;layer microelectronic materials
【24h】

Internal stress and internal friction in thinhyphen;layer microelectronic materials

机译:Internal stress and internal friction in thinhyphen;layer microelectronic materials

获取原文

摘要

Understanding of the static internal stress in supported thin layers can be aided by the use of dynamic mechanical analysis, with emphasis on internal friction measurements for the detection of defects susceptible to stresshyphen;induced ordering. In addition to the bendinghyphen;bilayer and vibratinghyphen;reed methods used for separate measurements of internal stress and internal friction, a new vibratinghyphen;membrane method is described that enables both quantities to be measured concurrently on the same sample. Structural relaxation, solute sorption, orientational ordering, and surface reaction are identified as four general phenomena affecting the internal stress, and experimental results are given for each of these categories. The bendinghyphen;bilayer method has been used to observe stress changes associated with structural relaxation in amorphous SiO films, and with the sorption and orientational ordering of oxygen in Nb films. The vibratinghyphen;membrane method has been used to study stress changes in boronhyphen;doped Si membranes, resulting from either hydrogen sorption or highhyphen;temperature oxidation. Hydrogen sorption leads to the appearance of a new internal friction peak located near 130 K, which is governed by an activation energy of 0.23 eV.

著录项

  • 来源
    《journal of applied physics 》 |1990年第8期| 3661-3668| 共页
  • 作者

    B. S. Berry; W. C. Pritchet;

  • 作者单位
  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类
  • 关键词

获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号