Laser chemical vapor deposition: A technique for selective area deposition

摘要

Laser chemical vapor deposition (LCVD) uses a focused laser beam to locally heat the substrate and drive the CVD deposition reacton. Several different deposition reactions and substrates have been examined as a function of intensity and irradiation time using a CO2laser source: Ni on SiO2, TiO2on SiO2, TiC on SiO2, and TiC on stainless steel. LCVD film thicknesses range from 100 Aring; to gsim;20 mgr;m. Deposition rates of mm/min have been observed for LCVD Ni and 20 mgr;m/min for LCVD TiO2. The diameter of the deposited films is dependent on irradiation conditions and can be as small as one tenth of the laser beam diameter. The LCVD films exhibit excellent physical properties such as adherence, conductivity, hardness, and smoothness.