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Mechanical stresses upon hydrogen induced optical switching in thin films

机译:薄膜中氢诱导光开关的机械应力

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摘要

Films that can change their optical properties upon exposure to hydrogen offer a wide range of interesting applications. Frequently, the change of optical properties is related to a volume change, which can lead to considerable mechanical stresses causing property deterioration. In an effort to compare the behavior of different material classes that enable hydrogen induced switching, we have studied Mg, Gd, and WOx films. The measurements were carried out using a wafer curvature setup, which allows simultaneous measurements of the mechanical stress and the optical transmission and reflection of the coatings. The magnitude of the stress changes involved in the switching of these materials is found to vary significantly. Stress changes of several GPa are observed in the switching of Gd, while the switching of Mg involves stress changes of several hundreds of MPa. In the case of WOx stress changes of only the order of 100 MPa are found. Reversible switching has been found in the case of WOx. While Gd shows irreversible stress changes upon first switching, it shows reversible behavior upon subsequent switching processes. The Mg films show irreversible switching, and additionally, their durability is found to be hampered by oxidation, which is accelerated by stress induced defect formation in the films. (C) 2003 American Institute of Physics. References: 16
机译:暴露于氢气后可以改变其光学特性的薄膜提供了广泛有趣的应用。通常,光学特性的变化与体积变化有关,这可能导致相当大的机械应力,导致性能下降。为了比较能够实现氢诱导开关的不同材料类别的行为,我们研究了 Mg、Gd 和 WOx 薄膜。测量是使用晶圆曲率设置进行的,该设置允许同时测量机械应力以及涂层的光学传输和反射。发现这些材料的切换所涉及的应力变化的大小差异很大。在Gd的切换中观察到几个GPa的应力变化,而Mg的切换涉及数百MPa的应力变化。在WOx应力变化的情况下,仅发现100 MPa量级的变化。在WOx的情况下发现了可逆开关。虽然 Gd 在第一次开关时表现出不可逆的应力变化,但它在随后的开关过程中表现出可逆的行为。Mg薄膜显示出不可逆的开关,此外,它们的耐久性受到氧化的阻碍,氧化因薄膜中应力引起的缺陷形成而加速。(C) 2003年美国物理学会。[参考文献: 16]

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