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FORMATION OF TRICHLORONITROMETHANE FROM ASPARTIC ACID DURING UV/CHLORINE DISINFECTION

机译:紫外线/氯消毒过程中天冬氨酸生成三氯硝基甲烷

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摘要

The formation of trichloronitromethane (TCNM) was investigated during the chlorination of aspartic acid under low pressure (LP) UV irradiation (λ=254nm). LP UV/chlorine disinfection enhanced the formation of TCNM for the first instance, furthermore the concentration of TCNM increased by 10 times in 5 mins. Then, an obvious decrease was observed in the formation of TCNM, and TCNM was nearly undetectable after 22 min. The effects of light intensity, initial concentration of aspartic acid, pH value, free chlorine concentration and the addition of tertbutanol (TBA) on the formation of T CNM were also investigated under UV/chlorine condition. The formation of TCNM increases with the increase of pH value, UV light intensity, initial concentration of aspartic acid, free chlorine concentration. TBA has a minor effect on formation of TCNM in the solution containing aspartic acid under UV/chlorine condition. So hydroxyl radical doesn't play a most important role in TCNM formation from aspartic acid under UV/chlorine. A possible integrated pathway of TCNM formation from aspartic acid is proposed under UV/chlorine. The new information obtained in this study will reduce the risk of TCNM formation during the treatment of drinking water and waste water. It will helpful for the control of T CNM formation in drinking water and sewage treatment and the development of new disinfection process.
机译:研究了天冬氨酸在低压(LP)紫外辐照(λ=254nm)下氯化过程中三氯硝基甲烷(TCNM)的形成。LP紫外线/氯消毒首次增强了TCNM的形成,此外,TCNM的浓度在5分钟内增加了10倍。然后,观察到TCNM的形成明显减少,22 min后TCNM几乎检测不到。研究了紫外/氯条件下光强度、天冬氨酸初始浓度、pH值、游离氯浓度和特丁醇(TBA)添加对T CNM形成的影响。TCNM的形成随着pH值、紫外光强度、天冬氨酸初始浓度、游离氯浓度的增加而增加。TBA对紫外/氯条件下含天冬氨酸溶液中TCNM的形成影响较小。因此,羟基自由基在紫外线/氯气下天冬氨酸形成的TCNM中不起最重要的作用。提出了一种在紫外/氯气下从天冬氨酸形成TCNM的可能综合途径。本研究获得的新信息将降低饮用水和废水处理过程中TCNM形成的风险。有助于控制饮用水和污水处理中T CNM的形成,并开发新的消毒工艺。

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