Crystallinity andI‐Vcharacteristics of Ag thin films deposited on fractal substrates

摘要

The crystallinity, surface morphology, andI‐Vcharacteristics of the Ag thin films deposited on fractal substrates by rf magnetron sputtering have been investigated. The poor crystallinity, fractal surface morphology, and abnormal nonlinearI‐Vbehavior of the thin films have been observed. The crystallinity of the films deposited on the fractal substrates is improved by increasing the substrate temperature and the thickness of the thin films. The nonlinearI‐Vcharacteristics are influenced by the thickness of the thin films, substrate temperature, and measuring environment.