机译:Micrometer- and Nanometer-Scale Photopatterning Using 2-Nitrophenylpropyloxycarbonyl-Protected Aminosiloxane Monolayers
Univ Sheffield, Dept Chem, Sheffield S3 7HF, S Yorkshire, England.;
Univ Manchester, Sch Chem, Manchester M1 7DN, Lancs, England.;
SELF-ASSEMBLED MONOLAYERS; NEAR-FIELD PHOTOLITHOGRAPHY; DIP-PENNANOLITHOGRAPHY; CONSTRUCTIVE NANOLITHOGRAPHY; SPATIAL-RESOLUTION; PROTECTING GROUPS; X-RAYS; NANOSTRUCTURES; FABRICATION; GLASS;