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Magnon Brillouin scattering in FeSi sputtered films

机译:FeSi溅射薄膜中的Magnon Brillouin散射

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Thermally excited spin waves in sputtered FeSi films (2.6 wt.  of Si) have been studied at room temperature by Brillouin scattering in external magnetic fields of up to 4.0 kOe. Scattering from the Damon–Eshbach surface mode and the standing spin waves has been observed. The magnetic constants of the FeSi films are determined as follows: ggr;/2pgr; =2.87±0.06 GHz/kOe,g=2.05±0.04, 4pgr;Ms=19.9±0.4 kG, 4pgr;Mb=20.1±0.4 kG, andDb=1.18±0.24×10−9Oe cm2. Here, the subscriptssandbrefer to surface and bulk, respectively.
机译:在室温下,通过布里渊散射在高达4.0 kOe的外部磁场中研究了溅射FeSi薄膜(2.6 wt.%Si)中的热激发自旋波。已经观察到Damon-Eshbach表面模式的散射和驻置自旋波。FeSi薄膜的磁常数为:&ggr;/2&pgr;=2.87±0.06 GHz/kOe,g=2.05±0.04,4&pgr;Ms=19.9±0.4 kG,4&pgr;Mb=20.1±0.4 kG,Db=1.18±0.24×10−9Oe cm2。在这里,下标sandb分别指表面和散装。

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