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首页> 外文期刊>Journal of Applied Physics >Single asperity tribochemical wear of silicon nitride studied by atomic force microscopy
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Single asperity tribochemical wear of silicon nitride studied by atomic force microscopy

机译:Single asperity tribochemical wear of silicon nitride studied by atomic force microscopy

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摘要

Nanometer scale single asperity tribochemical wear of silicon nitride was examined by measuring the wear of atomic force microscope tips translated against a variety of substrates in aqueous solutions. We show that the chemical nature of the substrate plays an important role: significant wear was observed only when the substrate surface is populated with appropriate metal-hydroxide bonds. Mica and calcite substrates, whose water-exposed cleavage surfaces lack these bonds, produced little if any tip wear. As a function of contact force F_(N) and scan duration t, the length of the tips in this work decreases approximately as (F_(N)t)~(0.5). We propose that pressure-induced intermediate states involving hydroxyl groups form on both the tip and the substrate; chemical reactions subsequently form transient bridging chemical bonds that are responsible for tip wear.

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