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首页> 外文期刊>電子情報通信学会技術研究報告. シリコン材料·デバイス. Silicon Devices and Materials >High Density (256Mb and Beyond) PRAM Integration Using 3-D Cell Array Transistors
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High Density (256Mb and Beyond) PRAM Integration Using 3-D Cell Array Transistors

机译:High Density (256Mb and Beyond) PRAM Integration Using 3-D Cell Array Transistors

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摘要

PRAM integration technologies using 3-D cell array transistor were proposed to realize the reliable high density 256Mb PRAM (Phase Change RAM) product. Introducing the 3-D cell array transistor, sufficient programming current with the good scalability and reliability was obtained. The cost effectiveness, reliability and performance in the product level will be reviewed.

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