Chemical analysis has been made of 361‐A˚ thermal oxide films nitrided in ammonia and also subsequently reoxidized in oxygen at 1000 °C, using techniques of ellipsometry and infrared spectrometry. The nitrided film is shown to have a three‐layer structure consisting of 22 A˚ of 48 nitrogen, 334 A˚ of 17 nitrogen, and 7.4 A˚ of 100 nitrogen, where the fractions refer to N/(N+O). After oxidation, the interface layer was unchanged and the surface merged into the bulk, the nitrogen content of which was reduced to 11. The void content has also been determined.
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