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首页> 外文期刊>journal of applied physics >nhyphen;type (Pb)Te doping of GaAs and AlxGa1minus;xSb grown by molecularhyphen;beam epitaxy
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nhyphen;type (Pb)Te doping of GaAs and AlxGa1minus;xSb grown by molecularhyphen;beam epitaxy

机译:nhyphen;type (Pb)Te doping of GaAs and AlxGa1minus;xSb grown by molecularhyphen;beam epitaxy

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A PbTe flux has been used fornhyphen;type (Te) doping of GaAs, GaSb, and AlGaSb. The effects of surface accumulation and Te desorption were noticeable in secondaryhyphen;ion mass spectroscopy profiles of GaAs layers grown at temperatures in excess of 540thinsp;deg;C. Te accumulation was not apparent in GaSb layers grown at temperatures up to 630thinsp;deg;C, but Te desorption occurred from GaSb at temperatures above 540thinsp;deg;C. The donor ionization energy of Te in AlxGa1minus;xSb is 44 meV for 0.4X0.5, i.e., significantly lower than the ionization energies of S or Se in similar material.

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