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首页> 外文期刊>Journal of Applied Physics >Designing two-dimensional electron gases in GaAs/InGaAs/AlGaAs, delta-doped AlGaAs/GaAs, and AlGaAs/InGaAs/GaAs heterostructures for single electron transistor application
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Designing two-dimensional electron gases in GaAs/InGaAs/AlGaAs, delta-doped AlGaAs/GaAs, and AlGaAs/InGaAs/GaAs heterostructures for single electron transistor application

机译:Designing two-dimensional electron gases in GaAs/InGaAs/AlGaAs, delta-doped AlGaAs/GaAs, and AlGaAs/InGaAs/GaAs heterostructures for single electron transistor application

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摘要

We have theoretically studied two types of two-dimensional electron gases (2DEGs) in GaAs/ InGaAs/AlGaAs and delta -doped-AlGaAs/GaAs heterostructures for single-electron transistor applications by self-consistently solving the Schrodinger and Poisson equations. Assuming the dominant effect of the ionized impurity scattering in determining the low-held carrier mobility, it has been shown that introducing an InGaAs layer to the conventional GaAs/AlGaAs heterostructure greatly increases the sheet density of the 2DEG and the corresponding carrier mobility. The delta -doped AlGaAs/GaAs and AlGaAs/InGaAs/GaAs heterostructures provide us with an even better control of the 2DEG with higher sheet density and carrier mobility. (C) 2001 American Institute of Physics. References: 10

著录项

  • 来源
    《Journal of Applied Physics》 |2001年第3期|1759-1763|共5页
  • 作者

    Fu Y.; Willander M.; Wang TH.;

  • 作者单位

    Chalmers Univ Technol, Microtechnol Ctr, Fysikgrand 3, S-41296 Gothenburg, Sweden.;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类 应用物理学;
  • 关键词

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