Metal-containing carbon (Me-C:H) films were deposited using the electron cyclotron resonance chemical vapor deposition technique in conjunction with a metal screen-grid system. Four sets of Me-C:H films were analyzed using Raman scattering. Two sets were molybdenum-containing carbon (Mo-C:H) films deposited at fixed dc bias (at different CH_(4)/Ar ratios), and at fixed CH_(4)/Ar ratio (at different dc bias). Another two sets of nickel-containing carbon (Ni-C:H) films were deposited at fixed rf power, but at a different CH_(4)/Ar ratio, with and without postgrowth thermal annealing at 200℃. All films showed the characteristic G and D peaks except for those with high metal content. The D peak is very pronounced in the Ni-C:H films, and both the G and D peaks follow an opposite trend; downshifting and upshifting in wave number, respectively, as the CH_(4)/Ar ratio was increased. In the case of Mo-C:H films deposited at fixed dc bias, both peaks downshifted in wave number, following an increase in the CH_(4)/Ar ratio. The G peak full width at half maximum for both the Ni- and Mo-C:H films increased slightly with an increase in CH_(4)/Ar ratio, consistent with the variation in the relative integrated intensity of the D to G peak (I_(D)/I_(G)). Thermal annealing experiments conducted on the film samples revealed relatively stable characteristics with a minor effect on the film structure. The results showed that the impinging ion energy plays an important role in the structural properties of the Me-C:H films.
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