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Noise and electrical transport properties of polycrystalline InSb thin films

机译:多晶InSb薄膜的噪声和电传输特性

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Both noise and electrical transport properties of polycrystalline InSb thin films are measured and analyzed for the same potential model. Films are prepared by evaporation upon sputtered SiO2glass and annealed in an Ar atmosphere. Films are inhomogeneously compensated and show what appears to bep‐ andn‐type conduction at low temperatures. It is found that then‐type films actually containp‐njunctions because the measured barrier heights reach the energy of the band gap. Between 150 and 77°K, low conducting sheets along grain boundaries with notch‐type barriers exist. Current noise of 1/ftype observed at room temperature is well correlated with this notch‐type barrier. A higher notch‐type barrier leads to lower mobility as well as higher noise voltage. This indicates that the noise originates in the bulk effect of the films.
机译:针对相同的电位模型,测量并分析了多晶InSb薄膜的噪声和电传输特性。薄膜是通过在溅射的SiO2玻璃上蒸发并在Ar气氛中退火来制备的。薄膜被不均匀地补偿,并显示出在低温下似乎bep‐和n‐型传导。研究发现,由于测得的势垒高度达到带隙的能量,因此,then‐型薄膜实际上包含p‐njunctions。在 150 和 77°K 之间,存在沿晶界的低导电片,具有缺口和连字符型势垒。在室温下观察到的 1/ftype 电流噪声与该陷波&连字符型势垒密切相关。较高的陷波和连字符型势垒会导致较低的迁移率和较高的噪声电压。这表明噪声源于薄膜的体效应。

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