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Deep hole traps in n-GaN films grown by hydride vapor phase epitaxy

机译:氢化物气相外延法生长的n-GaN薄膜中的深孔陷阱

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摘要

Concentrations of deep hole traps were measured in a set of hydride vapor phase epitaxy grown samples with thicknesses varying from 2.6 to 68 mum. Results were obtained from low temperature capacitance-voltage measurements before and after illumination and from deep level transient spectroscopy measurements with optical injection (ODLTS). The former revealed the presence of high densities (similar to10(15) to 10(16) cm(-3)) of hole traps whose concentration decreased with sample thickness in a manner similar to that found for the dislocation density. Capacitance versus temperature measurements in the dark and after illumination suggested that these traps form a band of states rather than a single level in the GaN band gap. It is suggested that such states could be associated with dislocations. The main hole traps observed by ODLTS were deep hole traps, of energy near E-v+0.9 eV. Their density was also observed to substantially decrease with sample thickness. (C) 2002 American Institute of Physics. References: 16
机译:在一组厚度从2.6到68 mum不等的氢化物气相外延生长样品中测量了深孔捕集器的浓度。结果来自照明前后的低温电容-电压测量以及光学注入 (ODLTS) 的深能级瞬态光谱测量。前者揭示了高密度(类似于10(15)至10(16)cm(-3))的空穴捕集器的存在,其浓度随着样品厚度的增加而降低,其方式与位错密度相似。在黑暗中和照明后,电容与温度的测量表明,这些陷阱在GaN带隙中形成了一个状态带,而不是一个能级。有人认为,这种状态可能与脱臼有关。ODLTS观测到的主要孔阱是能量接近E-v+0.9 eV的深孔阱。还观察到它们的密度随着样品厚度的增加而大幅降低。(C) 2002年美国物理学会。[参考文献: 16]

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