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首页> 外文期刊>Journal of Applied Physics >Fabrication and characterization of epitaxial NbN/MgO/NbN Josephson tunnel junctions
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Fabrication and characterization of epitaxial NbN/MgO/NbN Josephson tunnel junctions

机译:Fabrication and characterization of epitaxial NbN/MgO/NbN Josephson tunnel junctions

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摘要

We fabricated epitaxial NbN/MgO/NbN Josephson tunnel junctions with good tunneling characteristics in the range of J_(C)=0.2-70 kA/cm~(2). The counter and base NbN electrodes of the tunnel junctions had the same T_(C) and 20 K resistivity at about 15.7 K and 60 μΩ-cm, respectively. X-ray analysis showed that all the layers that formed the tunnel junctions grew epitaxially. In the range of J_(C)=0.2-15 kA/cm~(2), the tunnel junctions fabricated had large gap voltages (5.6-5.9 mV), narrow gap widths (less than 0.1 mV), high I_(C)R_(N) products (2.6-3.8 mV), and small subgap leakage current (V_(m)=40-96 mV).

著录项

  • 来源
    《Journal of Applied Physics》 |2001年第9期|4796-4799|共4页
  • 作者单位

    Communications Research Laboratory, KARC, 588-2 Iwaoka, Iwaoka-cho, Nishi-ku, Kobe 651-2492, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类 应用物理学;
  • 关键词

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