首页> 外文期刊>Journal of Applied Physics >Band gaps and lattice parameters of 0.9 μm thick In_(x)Ga_(1-x)N films for 0≤x≤0.140
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Band gaps and lattice parameters of 0.9 μm thick In_(x)Ga_(1-x)N films for 0≤x≤0.140

机译:0.9 μm厚In_(x)Ga_(1-x)N薄膜的带隙和晶格参数,用于0≤x≤0.140

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摘要

The c_(0) lattice parameter, band gap, and photoluminescence spectra of n-type 0.9 μm thick In_(x)Ga_(1-x)N films with x=0, 0.045, 0.085, and 0.140 were examined. The c_(0) lattice parameter followed Vegard's law using c_(0)=0.5185 nm for GaN and c_(0)=0.569 nm for InN. Band gap measurements by photocurrent spectroscopy fit well with data published by one other research group, with the combined set being described by the equation E_(g)=3.41-7.31x+14.99x~(2) for 0≤x≤0.15. Photoluminescence measurements with a pulsed nitrogen laser showed a peak well below the measured band gap, as well as significant luminescence above the measured band gap. The above-gap luminescence appears to be due to band filling by the high intensity laser pulses.
机译:研究了x=0、0.045、0.085和0.140的n型0.9 μm厚In_(x)Ga_(1-x)N薄膜的晶格参数、带隙和光致发光光谱。c_c_(0)晶格参数遵循Vegard定律,GaN的c_(0)=0.5185 nm,InN的c_(0)=0.569 nm。光电流光谱法的带隙测量结果与另一个研究小组发表的数据非常吻合,组合集由0≤x≤0.15的方程E_(g)=3.41-7.31x+14.99x~(2)描述。使用脉冲氮激光器进行的光致发光测量显示,峰值远低于测量的带隙,并且在测量的带隙上方有明显的发光。上述间隙发光似乎是由于高强度激光脉冲填充了能带。

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