Electroless deposition of Ag nanoparticles on the surface of SiN _x:H dielectric layers

摘要

A simple and effective method for producing Ag nanoparticles at room temperature and on the time scale of several minutes on the surface of hydrogenated Si nitride (SiN_x:H) films is presented. Depending on the stoichiometry of SiN_x:H layers, Ag nanostructures with different sizes and densities can be produced. The structural properties of the deposited Ag nanoparticles are described in details with respect to the stoichiometries of SiN_x:H films.