Measurement of dispersion in electrodeposited Cu2O

摘要

By using an optical reflectance interferometry method the refractive indexnof electrodeposited films of Cu2O was measured in the wavelength region of lgr;=0.466–1.2 mgr;m. This measurement was an extension to the previously reported values. The result fits well to an empirical dispersion equation of the formn2=1+4.81lgr;2/(lgr;2−0.125), where lgr; is in mgr;m. The dispersion values measured for electrodeposited films were found to be different from the reported values for other types of Cu2O.