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Electroreflectance of silver in smooth and microstructured tunnel junctions

机译:光滑和微结构隧道结中银的电反射率

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Measurements of the electroreflectance (ER) of smooth and microstructured Ag surfaces have been performed with use of Al‐Al2O3‐Ag tunnel junctions at room temperature. The ER spectra of smooth silver are found to be in excellent agreement with those reported earlier by Kolb and Kotz Surf. Sci.24, 417 (1971) in electrochemical cells. A dip athngr;=3.78 eV can be seen forppolarization and a peak appears athngr;=2.94 eV due to the surface plasmon excited at the Al‐Al2O3interface. In the microstructured junctions the very high field (∼1010V/cm) present at the top of the Ag posts induces a shift of the maximum at 3.9 eV forppolarization and a large negative signal in the 3–4 eV range which cannot be observed in the conventional ER experiments. The free‐electronlike theory of the ERs does not account for these experimental data.
机译:光滑和微结构的银表面的电反射率 (ER) 的测量是在室温下使用 Al‐Al2O3‐Ag 隧道结进行的。光滑银的内质网光谱与Kolb和Kotz[Surf之前报道的光谱非常吻合。Sci.24, 417 (1971)] 在电化学电池中。由于在Al‐Al2O3界面上激发的表面等离子体,可以看到下降ath&ngr;=3.78 eV,并且出现ath&ngr;=2.94 eV的峰值。在微结构结中,存在于 Ag 柱顶部的非常高的磁场 (∼1010V/cm) 会在 3.9 eV 的极化处引起最大偏移和 3-4 eV 范围内的大负信号,这在传统的 ER 实验中是无法观察到的。ERs的自由类电子理论没有解释这些实验数据。

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