机译:Atomic transport and integrity of Al2O3(2.0 nm)/HfO2(2.5 nm) gate stacks on Si
Univ Fed Rio Grande Sul, Inst Fis, BR-91501970 Porto Alegre, RS, Brazil;
IBM Corp, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA;
Univ Caxias Sul, CCET, BR-95070580 Caxias Do Sul, RS, Brazil;