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首页> 外文期刊>journal of applied physics >Steadyhyphen;state photocarrier grating technique for diffusionhyphen;length measurement in semiconductors: Theory and experimental results for amorphous silicon and semihyphen;insulating GaAs
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Steadyhyphen;state photocarrier grating technique for diffusionhyphen;length measurement in semiconductors: Theory and experimental results for amorphous silicon and semihyphen;insulating GaAs

机译:Steadyhyphen;state photocarrier grating technique for diffusionhyphen;length measurement in semiconductors: Theory and experimental results for amorphous silicon and semihyphen;insulating GaAs

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摘要

The theory underlying the steadyhyphen;state photocarrier grating technique is presented, including the effect of surface recombination. Experimental results for amorphous hydrogenated silicon and semihyphen;insulating GaAs prove that diffusion lengths ranging from 200 Aring; to 10 mgr;m can be measured with an accuracy of better than 5percnt;.

著录项

  • 来源
    《journal of applied physics》 |1987年第11期|4563-4570|共页
  • 作者

    D. Ritter; K. Weiser; E. Zeldov;

  • 作者单位
  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类
  • 关键词

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