Uniformity and composition of TbxFe1minus;xfilms prepared by magnetron sputtering using different types of targets

摘要

Uniformity and composition of TbxFe1minus;xfilms prepared by magnetron sputtering using different types of targets (a composite target and a compound target) is investigated. Composition of the films varies with the position of the substrates placed relative to the target for both types of targets, however the feature of this variation is very different for both targets. It is found that the most important factor which affects compositional variation of TbxFe1minus;xfilms is the difference of angular distributions of sputtered Tb and Fe atoms. The angular distributions of Tb and Fe atoms can be qualitatively explained by the difference of angular distribution of sputtered atoms from each metal for the composite target, and by the reflective collision model for the compound target, respectively.